Photolithography (Mask aligner)

Brand:SUSS
Model:MA/BA6 Gen4
Fixed asset number:S240001067
Affiliated Core: Microfabrication Core
Location:419 - Clean Room,Building A, Gaoke Innovation Center 
Equipment Manager:Zhou Xiaohu,Zhang Wendie
Contact:0755-2684 9243,zhangwendie@szbl.ac.cn

1. Chuck sizes: 6 inches, 4 inches, 3 inches, 2 inches
2. Exposure modes: four modes including vacuum contact, hard contact, soft contact, and proximity exposure
3. Light intensity: 365nm, 64.36mW/cm2; 405nm, 153.3mW/cm2, and the light intensity uniformity is better than ±2.5%

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